Access to IISc Research and Development Facilities
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E-Beam and Thermal Evaporator
HHV ( Hind High Vacuum Company Pvt Ltd )
E-beam evaporation is used to deposit a wide variety of materials.
6" Mask Aligner and Exposure System
MDA-400M-6
This highly accurate system allows researchers to easily develop their processes on wafers up to 6"
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Sputtering – DC & RF
HHV ( Hind High Vacuum Company Pvt Ltd )
500mm coating systems for research and production applications
Class-1000 Lithography Cleanroom Facility
Wet Bench
(Acid and Solvents)
Chemical Wet bench Acids is used for Piranha Cleaning/ HF dip/ Metal/Metal oxide etching of LEVEL 4 samples coming from lithography or other level 4 equipment's
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Oxygen plasma system
Etching and cleaning surfaces or for surface activation processes.
HB16 Wire Bonder
Making interconnections between an integrated circuit (IC) or other semiconductor device and its packaging during
Impedance Analyzer (GWINSTEK)
Data Acquisition, and Logging system,
DAQ6510, (KEITHLEY)
Function Generator
(GWINSTEK)
Digital Stereo Microscope
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3D printer
Micromanipulator
Access to IISc Research and Development Centralized Facilities
